Low Frequency Plasma Device PM100

Overview

• Barrel type and isotropic, plasma is generated throughout the
  chamber.
• Soft plasma as system uses low frequency wavelength.
• Suitable for biochemical systems.
• Uses oxygen as reaction gas.

Application

• Biochemistry (organic membrane treatment on glass substrate).
• Cleaning of glassware (sterilization).
• Cleaning of sample holder TEM, SEM, FIB etc. system.
• Treatment of sensor probe of analysis equipment.
• Acceleration test of coated film.
• Bonding of PDMS chip, glass, PDMS board.
• Degradation and acceleration test of coated film etc.

 

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Suitable for dry cleaning process such as the removal of organic substances, oxidized film, and for surface cleaning, etching, etc.

The electrodes can be replaced by specially developed electrodes to improve the plasma efficiency

High-precision matching unit and highly reliable RF generator

 

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PDC Series

Small and compact, suitable for R&D purposes

 

Features

• Simple and compact plasma surface treatment device
• RIE (Reactive Ion Etching) Plasma mode, with DP (Direct Plasma)
  mode as option (PDC200/210)
• Excellent electrode structure for plasma uniformity
• Simple touch panel system

Applications

• Plasma processing of CSP, BGA, COB substratum
• Removal of organic films and metal oxidized films
• Dry cleaning of printed circuit board
• Surfactant process
• LED assembly
• For R&D

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