Overview
Barrel type and isotropic, plasma is generated throughout the
chamber.
Soft plasma as system uses low frequency wavelength.
Suitable for biochemical systems.
Uses oxygen as reaction gas.
Application
Biochemistry (organic membrane treatment on glass substrate).
Cleaning of glassware (sterilization).
Cleaning of sample holder TEM, SEM, FIB etc. system.
Treatment of sensor probe of analysis equipment.
Acceleration test of coated film.
Bonding of PDMS chip, glass, PDMS board.
Degradation and acceleration test of coated film etc.
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The electrodes can be replaced by specially developed electrodes to improve the plasma efficiency
High-precision matching unit and highly reliable RF generator
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Small and compact, suitable for R&D purposes
Features
Simple and compact plasma surface treatment device
RIE (Reactive Ion Etching) Plasma mode, with DP (Direct Plasma)
mode as option (PDC200/210)
Excellent electrode structure for plasma uniformity
Simple touch panel system
Applications
Plasma processing of CSP, BGA, COB substratum
Removal of organic films and metal oxidized films
Dry cleaning of printed circuit board
Surfactant process
LED assembly
For R&D
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