Plasma Modifier

Low frequency
output

Low frequency high voltage
power supply

Reaction
chamber

I.D 100mm×L160mm

Low Frequency Plasma Device PM100

Overview

  • Barrel type and isotropic, plasma is generated throughout the
    chamber.
  • Soft plasma as system uses low frequency wavelength.
  • Suitable for biochemical systems.
  • Uses oxygen as reaction gas.

Application

  • Biochemistry (organic membrane treatment on glass substrate).
  • Cleaning of glassware (sterilization).
  • Cleaning of sample holder TEM, SEM, FIB etc. system.
  • Treatment of sensor probe of analysis equipment.
  • Acceleration test of coated film.
  • Bonding of PDMS chip, glass, PDMS board.
  • Degradation and acceleration test of coated film etc.

 

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Gas Plasma Cleaners

High-frequency
Output

1,000W
V1000

1,000~2000W
1000XS

Stage size

250×170mm
PDC20

400×375mm
V1000XS

Suitable for dry cleaning process such as the removal of organic substances, oxidized film, and for surface cleaning, etching, etc.

The electrodes can be replaced by specially developed electrodes to improve the plasma efficiency

High-precision matching unit and highly reliable RF generator

 

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Plasma dry cleaner

High-frequency
Output

300W
PDC200

500W
PDC210/510

Stage size

250×170mm
PDC200/210

400×200mm
PDC510

Internal capcaity: 150L: DKG610/610V/650/650V
300L: DKG810/810V/850/850V

PDC Series

Small and compact, suitable for R&D purposes

 

Features

  • Simple and compact plasma surface treatment device
  • RIE (Reactive Ion Etching) Plasma mode, with DP (Direct Plasma)
    mode as option (PDC200/210)
  • Excellent electrode structure for plasma uniformity
  • Simple touch panel system

Applications

  • Plasma processing of CSP, BGA, COB substratum
  • Removal of organic films and metal oxidized films
  • Dry cleaning of printed circuit board
  • Surfactant process
  • LED assembly
  • For R&D

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